Hydrogen silsesquioxane
Hydrogen silsesquioxane is class of inorganic compounds with the chemical formula n. Such clusters are specific representatives of the family of silsesquioxanes with the formula n. The most widely studied member of the hydrogen silsesquioxanes is the cubic cluster H8Si8O12.
HSQ has been used in photolithography and Electron-beam lithography due to the fine resolution achievable. Thickness of the coated resist has been reported to play a major role in the achievable resolution.
Cross-linking of the HSQ can is achieved through exposure to e-beam or EUV radiation with wavelengths shorter than 157 nm.
A collection of practical knowledge for using HSQ is provided by Georgia Tech.
